Ratnakar D Vispute
Blue Wave defines innovation at its finest and believes that placing a strategic focus on semiconductor fabrication equipment and device technologies will produce benefits that will enhance our ability to create the future of thin film technologies.
BlueWave Semiconductors. Whether you need dielectric coatings, transparent conductors, or metalized top contacts, our large library of materials and processes will provide you with the solution you need.
If not offered in our standard coating selections, we can provide you with custom thin film coatings for your applications. Synthetic diamond new name in coating technology! by BlueWaveSemi. Pulsed Laser Deposition (PLD) System. Product Description System Chamber The main PLD vacuum chamber has the following features and components: • 12” diameter stainless steel ultra-high vacuum electro-polished spherical chamber with multiport compatibility for PLD, 8” target carousel flange, oxygen resistance/compatible 2.2 inch dia substrate heater on 8” CF flange, process observation windows, pressure gauges, gas leak and vent, and blank ports.
The ports are designed to implement future addition of in-situ RHEED, in-situ Laser reflectivity measurement, Residual gas analyzer (RGA) and load lock chamber for wafer transfer. The chamber body is fabricated from electro-polished 304 stainless steel hemispheres. The spherical chamber is bakeable to 150ºC. Hot Filament Chemical Vapor Deposition (HFCVD) System. Product Description.
BlueWave Semiconductors. Thin Film and Coating Deposition System. Hot Filament Chemical Vapor Deposition (HFCVD) System. Thermal Evaporator System. Product Description Blue Wave Thermal Evaporation System uses resistive heating technique.
In this technique, a pair of water-cooled high current vacuum electrical feedthroughs are used to heat a boat (alumina coated titanium or alumina coated molybdenum) or a coil (tungsten) as the heating element. These boats/coils have a trench or slot for placing the evaporation sources (deposition material in the form of pellets, balls or random pieces) in them. When significant amount of current is passed through the feedthrough, the evaporation source is melted and evaporated. The rate of deposition depends on the amount of the current passed through i.e. higher the current, higher is the deposition rate and vice versa.
Thermal Chemical Vapor Deposition System - Bluewave Semiconductors. Product Description System Proto-typed 2012- Blue Wave Semiconductors Thermal Chemical Vapor Deposition system model BWI 2012 TESTED TCVD with 1″ diameter quartz reactor for growing carbon related materials on Si and related substrates.
System includes the following: 1100°C TUBE FURNACE: Robust tube furnace 1100°C configurable for horizontal mounting. Single zone models of 12″ heated length. Furnace use independent digital temperature control module which is available in standard or programmable options with easy operation. . • Designed for holding 1 cm to 1 x 1 inch samples. Electron Beam (EBeam) Evaporator System. Product Description High Vacuum Stainless Steel Deposition Chamber The main evaporation vacuum chamber has the following features and subcomponents:
Boron Nitride Substrate Heater For Vacuum Deposition. The Boron Nitride Substrate Heater is a vacuum process heater designed for processes wherein mostly non-reactive gases are used.
These heating modules are built to hold, heat, cool, rotate, and bias samples and wafers as a cost-effective tool for leading-edge research and development. Several variations of the Boron Nitride heater are available. Heating area diameters are available in sizes ranging from 1″ to 5″, and the substrate heater may be customized to incorporate both linear travel and substrate rotation features. Complementing power supplies with up to 2 kW of power are available in both rackmount and desktop units.Applications Vacuum Annealing, Doping, Catalytic ReactionIn-Situ Surface Science, R & DGas Sensor Temperature dependent CharacterizationEpitaxy of Oxides, Nitrides, Carbides, Metals Key Features.
Pulsed Laser Deposition (PLD) System. Thin Film and Coating Deposition System. Hot Filament Chemical Vapor Deposition (HFCVD) System. BlueWave Semiconductors. Blue Wave Featured in VT&C - Bluewave Semiconductors. BlueWave Semiconductors. Electron Beam (EBeam) Evaporator System. BlueWave Semiconductors. Blue Wave Semiconductors: Thermal Vapor Evaporation. Electron Beam (EBeam) Evaporator System. Hot Filament Chemical Vapor Deposition (HFCVD) System. Blue Wave Semiconductors- Thermal Vapor Evaporation. BlueWave Semiconductors. Sputtering Process- Blue Wave Semiconductors. Thin film deposition Services. HFCVD Heater Z and Rotation Stage. Electron Beam (EBeam) Evaporator System.
BWS Target Carousel. Electron Beam Evaporator System. HFCVD Heater Z and Rotation Stage. Custom Thin Film Deposition Systems. BWS Target Carousel. Hot Filament Chemical Vapor Deposition (HFCVD) System. Blue Wave Semiconductors Substrate Rotation 2.2 Inch Wafer up to 700C! Custom Thin Film Deposition Systems. Sputtering Process- Blue Wave Semiconductors. Boron Nitride Substrate Heater For Vacuum Deposition. 4shared.com - free file sharing and storage - Document Preview - text. Thinfilms and coatings by Ratnakar D Vispute. Bluewave Semiconductors. Bluewave Semiconductors. Bluewave Semiconductors. Thermal Evaporator System. Pulsed Laser Deposition (PLD) System.
OnlineE-Beam Evaporator Companies For High Quality Film Coating! - Bluewave Semiconductors. E-Beam evaporation is nothing but a physical vapor deposition (PVD) technique that is used for depositing thin films of various metals and oxides.
A powerful electron beam from a tungsten filament is generated and it through magnetic field to hit the source materials. The beam has adequate energy to vaporize the materials underhigh vacuum or reactive gas atmospheres. Typical vacuum can range from ultra-high vacuum to 1×10-4Torr. The electron beam of 6 to 10KV is generated which heatsthe material to its melting and vaporization points. The condensation of vapors occurs on the object or substrate of choice and coats it with the thin film of the selected material accordingly. There are several PVD classes for vacuum coating processes in which the substance is evaporated and transported in a vacuum.
E-beam PVD process thus has three mail components and these are: 1. Ppt blue wave semi - Download - 4shared - Ratnakar D Vispute. Electron Beam (EBeam) Evaporator System. Blue_wave_semiconductors. Bluewavesemi. Boron Nitride Substrate Heater For Vacuum Deposition. Pulsed Laser Deposition (PLD) System. Electron Beam Evaporator: A Quality Deposition Tool from Blue Wave Semiconductors - Bluewave Semiconductors. Electron Beam Evaporator is the unique machine which undergoes the process in which a targeted anode is bombarded with an electron beam which is generated by heated tungsten filament,under high vacuum.
In this way the source metal is heated above its boiling or sublimation point and evaporated in order to form a thin film on the surface of the substrate. The Electron Beam Evaporator has the ability to add greater amount of the energy into the source material and hence it can be used for high metaling/boiling point metals and ceramics for their thin film deposition. This thin film deposition technique is applied in semiconductor industries to integrate electronic devices with metal contacts. This technique also used for in coatings applicable to aerospace industry.
If you want to get an Electron Beam Evaporator with integration capability for you or your industry, you know that it is not an easy task to get this anywhere. Multi-Layer Coating Services. Hot Filament Chemical Vapor Deposition – A Best Product! - Bluewave Semiconductors. With widespread use of electronic devices the semiconductor industry has seen a lot of changes in manufacture of semiconductor devices.
Out of various stages for semiconductor manufacturing, fabrication process is one of the most important steps. For fabrication of functional layers over a substrate, the most commonly used technique is CVD (Chemical vapor Deposition). CVD is done in various processes. One of them is HFCVD (Hot Filament Chemical Vapor Deposition). The Blue Wave hot filament chemical vapor deposition system was built to produce concentrated, dense, adherent and coherent poly-crystalline diamond films on silicon, metallic and ceramic substrates.
The machine is designed to deposit various forms of diamond coatings (UNCD-ultra nano crystalline diamond, NCD-nano crystalline diamond) poly-crystalline diamond films and 2D carbon- that is graphene, which have broad use in electronic industry. BlueWave Semiconductors. A Brief Overview about Pulsed Laser Deposition System - Bluewave Semiconductors. Pulsed Laser Deposition, most commonly referred as PLD, typically uses a focused excimer laser pulses to vaporize a solid material in a vacuum chamber so as to construct a thin film with the same chemical composition as the original target material. In other words, it can be stated that the technique of Pulsed Laser Deposition is being used to deposit high quality films of materials for long years.
This tremendous technique uses high power laser pulses to evaporate, melt and ionize material from the surface of a target.This event of “ablation” produces a highly luminous and transient plasma plume, which expands swiftly away from the target surface. The ablated material is accumulated on a properly placed substrate to form the thin film or nanostructures. In spite of this extensive usage, the primary processes occurring during the transmission of material from target to substrate are not fully comprehended; consequently they require the focus of much research.